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電子系演講公告
Photolithography with a twist
Presenter: Martin Afromowitz
Martin Afromowitz is a Professor of Electrical Engineering at the University of Washington, Seattle, where his most recent work involves 3-D lithography.Professor Afromowitz received his undergraduate and graduate degrees from Columbia University in New York. He then worked at Bell TelephoneLaboratories for five years, concentrating on techniques for characterizingthe optical and thermal properties of GaAs, GaP and related materials.Since 1974, he has been at the University of Washington in Seattle. Hisprincipal research interests have been in optical sensing technologies and microfabrication. Most recently, he has developed techniques for using SU-8photoresist to fabricate tall structures with smoothly varying surface features. He is the author of several US Patents, and has served as aconsultant to industry and as an expert witness in patent litigation cases.
日期：94/8//23(二)
時間：上午9：30~11：30，下午2:00~4:00
地點：S104
WORKSHOP ABSTRACT: This workshop will be a tutorial on grayscale
lithography and 3-D methods. Topics will include
1. a brief review of conventional photolithographic processing
2. extensions of conventional photolithography into 3-D applications
3. grayscale lithography in positive resist
4. grayscale lithography in negative resist
5. techniques and materials for making grayscale masks
6. introduction to microstereolithography
7. introduction to two-photon lithography
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